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Control Automation for Semiconductor Deposition Equipment

Master the complex mechatronic, fluidic, and electromagnetic control architectures driving modern thin-film deposition with this authoritative technical guide. Designed for senior automation engineers, control leads, and equipment developers, this textbook bridges fundamental physical phenomena with hard real-time embedded system design across 30 chapters.

Through step-by-step mathematical derivations, worked engineering calculations, and industry case studies, this text deconstructs advanced equipment automation. Readers will explore:

• Multivariable Physical Control: Closed-loop pressure regulation, multi-zone thermal pedestal tuning, and gas flow dynamics across viscous and molecular flow regimes.

• High-Speed Power & Plasma Automation: Automated RF impedance matching networks, fast pulse-width power delivery, and sub-microsecond arc suppression logic.

• Embedded Hardware & Communication: Microcontroller and FPGA pipeline architectures, real-time operating systems (RTOS), and high-speed industrial fieldbuses like EtherCAT.

• Advanced Process Control (APC): Model Predictive Control (MPC), Run-to-Run (R2R) Exponentially Weighted Moving Average (EWMA) logic, and Fault Detection and Classification (FDC) algorithms.

• Functional Safety & Factory Integration: Hardwired Emergency Off (EMO) loops, SIL-rated safety interlocks, and full SECS/GEM and GEM300 factory integration standards.

Whether engineering temporal and spatial Atomic Layer Deposition (ALD) timing sequencers, designing sub-millisecond precursor dosing valves, or implementing edge-AI anomaly detection, this book delivers the concrete tools needed to build deterministic, zero-defect deposition platforms.

Complete with chapter review questions and hands-on simulation exercises, this volume serves as a vital reference for mastering the next generation of autonomous semiconductor capital equipment.

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